Nonuniform heating of a substrate in evaporative lithography-Reference-Cited by-同舟云学术

Nonuniform heating of a substrate in evaporative lithography

Author:

Al-Muzaiqer Mohammed A.¹²^ORCID,Kolegov Konstantin S.³⁴⁵^ORCID,Ivanova Natalia A.¹²^ORCID,Fliagin Viktor M.¹²^ORCID

Affiliation:

1. Photonics and Microfluidics Laboratory, X-BIO Institute, University of Tyumen, Tyumen 625003, Russia

2. Microfiltration Processes Laboratory, University of Tyumen, Tyumen 625003, Russia

3. Mathematical Modeling Laboratory, Institute of Physics and Mathematics, Astrakhan State University, Astrakhan 414056, Russia

4. Caspian Institute of Maritime and River Transport, Volga State University of Water Transport, Astrakhan 414000, Russia

5. Landau Institute for Theoretical Physics, Russian Academy of Sciences, Chernogolovka 142432, Russia

Funder

Russian Science Foundation

Ministry of Education and Science of the Russian Federation

Russian Foundation for Basic Research

Publisher

AIP Publishing

Subject

Condensed Matter Physics,Fluid Flow and Transfer Processes,Mechanics of Materials,Computational Mechanics,Mechanical Engineering

Link

Reference50 articles.

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