The distribution of OH radicals in a pulsed DC He + H2O plasma jet with the presence of a dielectric material-Reference-Cited by-同舟云学术

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The distribution of OH radicals in a pulsed DC He + H2O plasma jet with the presence of a dielectric material

Published:2021-01 Issue:1 Volume:28 Page:013503
ISSN:1070-664X
Container-title:Physics of Plasmas
language:en
Short-container-title:Physics of Plasmas

Author:

Lin Xin¹,Wang Lijun¹^ORCID,Liu Jie¹

Affiliation:

1. State Key Laboratory of Electrical Insulation and Power Equipment, Xi'an Jiaotong University, Xi'an 710049, China

Funder

National Key R&D Program of China

Fundamental Research Funds for the Central Universities

State Key Laboratory of Electrical Insulation and Power Equipment

Publisher

AIP Publishing

Subject

Condensed Matter Physics

Link

http://aip.scitation.org/doi/pdf/10.1063/5.0031598

Reference30 articles.

1. Effects of pH on Bacterial Inactivation in Aqueous Solutions due to Low-Temperature Atmospheric Pressure Plasma Application

2. Quantitative clarification of inactivation mechanism ofPenicillium digitatumspores treated with neutral oxygen radicals

3. Repetitively pulsed atmospheric pressure discharge treatment of rough polymer surfaces: I. Humid air discharges

4. Water-Vapor Plasma-Based Surface Activation for Trichlorosilane Modification of PMMA

5. A cold micro plasma jet device suitable for bio-medical applications

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1. Experimental study of the influence of O₂ content on electrical and optical characteristics of He/CF₄ APPJ;Journal of Physics D: Applied Physics;2024-05-07

2. Effect of CF₄ concentration on the discharge dynamics and reactive species distribution of atmospheric nanosecond pulsed He plasma jet;Journal of Physics D: Applied Physics;2023-09-13

3. Computational study on the discharge dynamics of atmospheric pressure He plasma driven by high frequency AC voltage;Physica Scripta;2023-01-05

4. Numerical study of the influence of O₂ admixture on the propagation and F-containing species distribution of He/CF₄ atmospheric pressure plasma jet;Journal of Applied Physics;2022-07-28

5. The distribution of F-containing species in atmospheric nanosecond He/CF₄ plasma with downstream dielectric material;Journal of Physics D: Applied Physics;2022-04-22

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