Effects of feedstock availability on the negative ion behavior in a C4F8 inductively coupled plasma
Author:
Affiliation:
1. School of Physics and Optoelectronic Engineering, Dalian University of Technology, Dalian 116024, People's Republic of China
2. Research group PLASMANT, Dept. Chemistry, University of Antwerp, Universiteitsplein 1, B-2610 Antwerp, Belgium
Funder
National Natural Science Foundation of China (NSFC)
Ministry of Science and Technology of the People's Republic of China (Chinese Ministry of Science and Technology)
Fonds Wetenschappelijk Onderzoek (Research Foundation Flanders)
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4926867
Reference46 articles.
1. Low-pressure diffusion equilibrium of electronegative complex plasmas
2. Particles in C2F6-CHF3and CF4-CHF3etching plasmas
3. Ion-acoustic waves in a complex plasma with negative ions
4. Radical dynamics in unstable CF4 inductive discharges
5. Influence of driving frequency on narrow-gap reactive-ion etching in SF6
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