Intermixing and thermal oxidation of ZrO2 thin films grown on a-Si, SiN, and SiO2 by metallic and oxidic mode magnetron sputtering
Author:
Affiliation:
1. Industrial Focus Group XUV Optics, MESA+Institute for Nanotechnology, University of Twente, P.O. Box 217, 7500 AE Enschede, The Netherlands
Funder
Carl Zeiss SMT
DEMCON
PANalytical
Province of Overijssel
SolMates
TNO
ASML
Nederlandse Organisatie voor Wetenschappelijk Onderzoek (NWO)
Stichting voor Fundamenteel Onderzoek der Materie (FOM)
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4978367
Reference56 articles.
1. High-κ gate dielectrics: Current status and materials properties considerations
2. Structural and optical characterization of ZrO2 thin films grown on silicon and quartz substrates
3. Highly transparent porous ZrO2 thin films: fabrication and optical properties
4. Submicron focusing of XUV radiation from a laser plasma source using a multilayer Laue lens
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