Structural and optical characterization of ZrO2 thin films grown on silicon and quartz substrates
Author:
Publisher
Springer Science and Business Media LLC
Subject
Physics and Astronomy (miscellaneous)
Link
http://link.springer.com/content/pdf/10.1007/s40094-016-0218-8.pdf
Reference23 articles.
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2. Ma, C.Y., Laspostolle, F., Briois, P., Zhang, Q.Y.: Effect of O2 gas partial pressure on structures and dielectric characteristics of rf sputtered ZrO2 thin films. Appl. Surf. Sci. 253, 8718 (2007)
3. Wong, Y.H., Cheong, K.Y.: Band alignment and enhanced breakdown field of simultaneously oxidized and nitrided Zr film on Si. Nanoscal. Res. Lett. 6, 489 (2011)
4. Khojier, K., Savaloni, H., Jafari, F.: Structural, electrical, and decorative properties of sputtered zirconium thin films during post-annealing process. J. Theor. Appl. Phys. 7, 55 (2013)
5. Andrieux, M., Ribot, P., Gasqueres, C., Servet, B., Garry, G.: Effect of the oxygen partial pressure on the toughness of tetragonal zirconia thin films for optical applications. Appl. Surf. Sci. 263, 284 (2012)
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