Marker experiments for diffusion in the silicide during oxidation of PdSi, Pd2Si, CoSi2, and NiSi2films on 〈Si〉
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.332721
Reference12 articles.
1. Thermal oxidation of cobalt disilicide
2. Marker studies of silicide formation, silicon self-diffusion and silicon epitaxy using radioactive silicon and Rutherford backscattering
3. Studies of the Growth and Oxidation of Metal‐Silicides Using Radioactive 31Si as Tracer
4. Co2Si, CrSi2, ZrSi2 and TiSi2 formation studied by a radioactive 31Si marker technique
5. Radioactive Ni∗ tracer study of the nickel silicide growth mechanism
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