Co2Si, CrSi2, ZrSi2 and TiSi2 formation studied by a radioactive 31Si marker technique
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
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1. Identification of the dominant diffusing species in silicide formation
2. Structure and growth kinetics of Ni2Si on silicon
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4. Implanted noble gas atoms as diffusion markers in silicide formation
5. Metallurgical and electrical properties of chromium silicon interfaces
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