Deposition of microcrystalline silicon prepared by hot-wire chemical-vapor deposition: The influence of the deposition parameters on the material properties and solar cell performance-Reference-Cited by-同舟云学术

Deposition of microcrystalline silicon prepared by hot-wire chemical-vapor deposition: The influence of the deposition parameters on the material properties and solar cell performance

Published:2005-07-15 Issue:2 Volume:98 Page:024905
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Klein Stefan,Finger Friedhelm,Carius Reinhard,Stutzmann Martin

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.1957128

Reference75 articles.

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2. Potential of amorphous silicon for solar cells

3. High Rate Deposition of Microcrystalline Silicon Using Conventional Plasma-Enhanced Chemical Vapor Deposition

4. Device grade microcrystalline silicon owing to reduced oxygen contamination

5. K. Saito, M. Sano, K. Matuda, T. Kondo, T. Nishimoto, K. Ogawa, and I. Kajita, in Proceedings of the Second World Conference on Photovoltaic Solar Energy Conversion, Vienna, Italy, 1998 (European Commission, Ispra, Italy, 1998), p. 351.

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