Anomalous substrate and annealing temperature dependencies of heavily boron‐doped hydrogenated amorphous silicon
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.338016
Reference14 articles.
1. Recent progress of amorphous silicon technology and its application to optoelectronic devices
2. Application of amorphous silicon field effect transistors in addressable liquid crystal display panels
3. Photoconductive imaging using hydrogenated amorphous silicon film
4. Amorphous Si:H Heterojunction Photodiode and its Application to a Compact Scanner
5. Anomalous Optical and Structural Properties of B-Doped a-Si:H
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