Growth of amorphous-layer-free microcrystalline silicon on insulating glass substrates by plasma-enhanced chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.119958
Reference10 articles.
1. Recent Progress in Microcrystalline Semiconductor Thin Films
2. Structure of Polycrystalline Silicon Thin Film Fabricated from Fluorinated Precursors by Layer-by-Layer Technique
3. Real-time spectroscopic ellipsometry study of the growth of amorphous and microcrystalline silicon thin films prepared by alternating silicon deposition and hydrogen plasma treatment
4. Bond Selectivity in Silicon Film Growth
5. Substrate dependence of initial growth of microcrystalline silicon in plasma‐enhanced chemical vapor deposition
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