Attenuated total reflection Fourier transform infrared spectroscopy study of the adsorption of organic contaminants on a hydrogen-terminated Si(111) surface in air
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.124755
Reference16 articles.
1. Influence of silicon-wafer loading ambients in an oxidation furnace on the gate oxide degradation due to organic contamination
2. Impact of Organic Contaminants from the Environment on Electrical Characteristics of Thin Gate Oxides
3. Investigations on hydrophilic and hydrophobic silicon (100) wafer surfaces by X-ray photoelectron and high-resolution electron energy loss-spectroscopy
4. Effect of organic contaminants on the oxidation kinetics of silicon at room temperature
5. Study on Adsorption Behavior of Organic Contaminations on Silicon Surface by Gas Chromatography/Mass Spectrometry
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