Detection and depth analyses of deep levels generated by ion implantation in n- and p-type 4H-SiC
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3159901
Reference26 articles.
1. Deep Defect Centers in Silicon Carbide Monitored with Deep Level Transient Spectroscopy
2. Deep level defects in electron-irradiated 4H SiC epitaxial layers
3. Deep levels created by low energy electron irradiation in 4H-SiC
4. Investigation of deep levels in n-type 4H-SiC epilayers irradiated with low-energy electrons
5. Photoluminescence and transport studies of boron in 4H SiC
Cited by 67 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Depth profiles of electron and hole traps generated by reactive ion etching near the surface of 4H-SiC;Journal of Applied Physics;2024-09-06
2. A review of silicon carbide CMOS technology for harsh environments;Materials Science in Semiconductor Processing;2024-08
3. Depth profiles of deep levels generated in the tail region of Al ion implantation into n-type 4H-SiC;Japanese Journal of Applied Physics;2024-06-03
4. Formation of ohmic contacts on heavily Al+-implanted p-type SiC without an alloying process;Japanese Journal of Applied Physics;2024-05-01
5. Al-implantation induced damage in 4H-SiC;Materials Science in Semiconductor Processing;2024-05
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3