Stopping potential and ion beamlet control for micro-resistive patterning through sub-Debye length plasma apertures
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://scitation.aip.org/deliver/fulltext/aip/journal/adva/4/12/1.4904371.pdf?itemId=/content/aip/journal/adva/4/12/10.1063/1.4904371&mimeType=pdf&containerItemId=content/aip/journal/adva
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