Reconstruction of IrO2/(Pb, La)(Zr, Ti)O3 (PLZT) interface by optimization of postdeposition annealing and sputtering conditions
Author:
Affiliation:
1. Devices and Materials Laboratory, Fujitsu Laboratories Ltd., Kawasaki 211-8588, Japan
2. Technology Division, System Memory Company, Fujitsu Semiconductor Ltd., Yokohama 222-0033, Japan
3. Wakayama University, Wakayama 640-8510, Japan
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.5091501
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