Output characteristics of a discharge‐pumped F2laser (157 nm) with an injection‐seeded unstable resonator
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.354706
Reference19 articles.
1. Hydrogenated amorphous silicon prepared by ArF and F2excimer laser‐induced photochemical vapor deposition
2. Submicron, vacuum ultraviolet contact lithography with an F2excimer laser
3. Contact lithography at 157 nm with an F2 excimer laser
4. Direct-etching studies of polymer films using a 157-nm F_2 laser
5. Novel method for measuring excimer laser ablation thresholds of polymers
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1. Note: Longitudinally excited N2 laser with low beam divergence;Review of Scientific Instruments;2014-09
2. An Ultra-Line-Narrowed High-Power<tex>$hboxF_2$</tex>Laser for Dioptric Design Microlithography Exposure Tools;IEEE Journal of Selected Topics in Quantum Electronics;2004-11
3. Line Narrowing and Injection Locking of F2Lasers;Japanese Journal of Applied Physics;2004-08-10
4. Spectral–kinetic characteristics of the F2 laser transition;Applied Physics B;2004-02
5. Ultra-Line-Narrowed High Power F2Laser System for Microlithography;Japanese Journal of Applied Physics;2003-07-15
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