Characterization of chemical-vapor-deposited low-k thin films using x-ray porosimetry
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1553996
Reference10 articles.
1. concentrates
2. Ultralow-k dielectrics prepared by plasma-enhanced chemical vapor deposition
3. Determination of Pore Size in Mesoporous Thin Films from the Annihilation Lifetime of Positronium
4. Determination of pore size distribution in thin films by ellipsometric porosimetry
5. Structural Comparison of Hydrogen Silsesquioxane Based Porous Low-k Thin Films Prepared with Varying Process Conditions
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