Recrystallization and grain growth phenomena in polycrystalline Si/CoSi2thin‐film couples
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.346744
Reference23 articles.
1. A self-aligned cobalt silicide technology using rapid thermal processing
2. Characterization of a Self‐Aligned Cobalt Silicide Process
3. Formation and thermal stability of CoSi2on polycrystalline Si
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