Growth of HfN thin films by reactive high power impulse magnetron sputtering-Reference-Cited by-同舟云学术

Growth of HfN thin films by reactive high power impulse magnetron sputtering

Published:2018-03 Issue:3 Volume:8 Page:035124
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Thorsteinsson D. Ö.¹,Gudmundsson J. T.¹²^ORCID

Affiliation:

1. Science Institute, University of Iceland, Dunhaga 3, IS-107 Reykjavik, Iceland

2. Department of Space and Plasma Physics, School of Electrical Engineering and Computer Science, KTH–Royal Institute of Technology, SE-100 44 Stockholm, Sweden

Funder

VINNOVA

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5025553

Reference62 articles.

1. Properties and microelectronic applications of thin films of refractory metal nitrides

2. Handbook of Inorganic Compounds

3. The hafnium-nitrogen system: Phase equilibria and nitrogen diffusivities obtained from diffusion couples

4. Structure and Electrical Properties of Sputtered Films of Hafnium and Hafnium Compounds

Cited by 15 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Research Trends of Atomic Layer Deposition of Metal Nitrides and Their Applications in Semiconductor Industry;Ceramist;2024-03-31

2. A comparative study on the hardness, stress and surface free energy of HfN films grown by HIPIMS and direct-current magnetron sputtering;Surface and Coatings Technology;2024-02

3. Industrial application potential of high power impulse magnetron sputtering for wear and corrosion protection coatings;Journal of Applied Physics;2023-10-23

4. Phase composition of polycrystalline HfNx (0.45 ≤ x ≤ 1.60) and effects of low-energy ion irradiation on microstructure, texture, and physical properties;Journal of Vacuum Science & Technology A;2023-10-10

5. Mechanical and Structural Behaviors of HfN Thin Films Fabricated by Direct Current and Mid-frequency Magnetron Sputtering;CORROS SCI TECHNOL-K;2023