Microcrystalline silicon solar cells deposited using a plasma process excited by tailored voltage waveforms
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3699222
Reference13 articles.
1. Optimization of the electrical asymmetry effect in dual-frequency capacitively coupled radio frequency discharges: Experiment, simulation, and model
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3. Nanocrystalline silicon film growth morphology control through RF waveform tailoring
4. E. V. Johnson, S. Pouliquen, P. A. Delattre, and J. P. Booth, “Hydrogenated microcrystalline silicon thin films deposited by RF-PECVD under low ion bombardment energy using voltage waveform tailoring,” J. Non-Cryst. Solids (in press).10.1016/j.jnoncrysol.2012.01.014
5. Hydrogenated amorphous silicon deposited under accurately controlled ion bombardment using pulse-shaped substrate biasing
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