Author:
Stranak V.,Herrendorf A.-P.,Drache S.,Cada M.,Hubicka Z.,Tichy M.,Hippler R.
Subject
Physics and Astronomy (miscellaneous)
Reference17 articles.
1. K. Ellmer, in Low Temperature Plasmas, edited by R. Hippler, H. Kersten, M. Schmidt, and K. H. Schoenbach (Wiley-VCH, Weinheim, 2009), Vol. 2, p. 675.
2. On the film density using high power impulse magnetron sputtering
3. High power pulsed magnetron sputtering of transparent conducting oxides
4. Fully dense, non-faceted 111-textured high power impulse magnetron sputtering TiN films grown in the absence of substrate heating and bias
5. Titanium oxide thin films deposited by high-power impulse magnetron sputtering
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