Effects of rapid thermal anneal on refractive index and hydrogen content of plasma‐enhanced chemical vapor deposited silicon nitride films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.363480
Reference18 articles.
1. PECVD grown silicon nitride AR coatings on polycrystalline silicon solar cells
2. On H Passivation of Si Donors in GaAs Annealed with Plasma‐ Enhanced Chemical Vapor Deposited Silicon Nitride Caps
3. High‐efficiency silicon solar cells by rapid thermal processing
4. Defect passivation in multicrystalline‐Si materials by plasma‐enhanced chemical vapor deposition of SiO2/SiN coatings
5. Effects of nitrogen and argon as carrier gases and annealing ambients on the physical properties of PECVD silicon nitride
Cited by 42 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Effect of mechanical stress on the traps in silicon nitride thin films;Current Applied Physics;2024-01
2. Stoichiometry dependent changes in the optical properties and nanoscale track formation of PECVD grown a-SiNx:H thin films upon 100 MeV Au8+ ion irradiation;Current Applied Physics;2021-04
3. Improvement in the moisture barrier properties and flexibility by reducing hydrogen dangling bonds in SiNx thin films with plasma surface treatment;Surface and Coatings Technology;2020-02
4. Optical Characterization of Non-Stoichiometric Silicon Nitride Films Exhibiting Combined Defects;Coatings;2019-06-28
5. SiNx bilayer grating coupler for photonic systems;OSA Continuum;2018-09-12
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3