Mechanism of cleaning and etching Si surfaces with low energy chlorine ion bombardment
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.356160
Reference26 articles.
1. Chemical and electronic structure of the SiO2/Si interface
2. Surface electrical properties of HF‐treated Si(100)
3. Mechanisms of the HF/H2O vapor phase etching of SiO2
4. Optimization and numerical models of silicon solar cells
5. Optimization and numerical models of silicon solar cells
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