High current vacuum-arc ion source for ion implantation and coating deposition technologies-Reference-Cited by-同舟云学术

High current vacuum-arc ion source for ion implantation and coating deposition technologies

Published:2006-03 Issue:3 Volume:77 Page:03B516
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Review of Scientific Instruments

Author:

Ryabchikov Alexander I.,Ryabchikov Igor A.,Stepanov Igor B.,Dektyarev Sergey V.

Publisher

AIP Publishing

Subject

Instrumentation

Link

http://aip.scitation.org/doi/pdf/10.1063/1.2171674

Reference17 articles.

1. Review of cathodic arc deposition technology at the start of the new millennium

2. N. N. Koval, I. M. Goncharenko, S. V. Grigoriev, and P. M. Schanin. Proceedings of the Fifth Conference on Modification of Materials with Particle Beams and Plasma Flows, Tomsk, Russia, 2000 (Kursiv, Tomsk, 2000), p. 424.

3. The deposition of TiN thin films by filtered cathodic arc techniques

4. Formation of copper nitrides in the course of implanting copper with large doses of nitrogen ions

5. Recent advances in surface processing with metal plasma and ion beams

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