Open-tube solid-state diffusion of Zn into n-type GaAs0.35P0.65 from ZnO oxide films and electroluminescence
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.366833
Reference28 articles.
1. Near‐ideal lateral scaling in abrupt Al0.48In0.52As/In0.53Ga0.47As heterostructure bipolar transistors prepared by molecular beam epitaxy
2. High-speed divider using GaAs ECL/CML gate array
3. Diffusion of Zn across p-n junctions in Ga0.47In0.53As
4. Reduction of zinc diffusion into the collector of InP‐based double heterojunction bipolar transistors grown by organometallic chemical vapor deposition
5. Enhanced Zn diffusion in GaAs pnpn structures: Growth versus annealing
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1. Erroneous p-type assignment by Hall effect measurements in annealed ZnO films grown on InP substrate;Journal of Applied Physics;2013-04-28
2. Observation of interfacial reactions and recrystallization of extrinsic phases in epitaxial grown ZnO/GaAs heterostructures;Journal of Crystal Growth;2008-09
3. gallium arsenide phosphide (GaAs(1-x)P(x)), solubility and diffusion of impurities;Impurities and Defects in Group IV Elements, IV-IV and III-V Compounds. Part b: Group IV-IV and III-V Compounds.
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