Effect of ozone annealing on the dielectric properties of tantalum oxide thin films grown by chemical vapor deposition
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.103323
Reference3 articles.
1. Quadruply self-aligned stacked high-capacitance RAM using Ta2O5high-density VLSI dynamic memory
2. Oxidation temperature dependence of the dc electrical conduction characteristics and dielectric strength of thin Ta2O5films on silicon
3. Photo-Process of Tantalum Oxide Films and Their Characteristics
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