A high efficiency ultrahigh vacuum compatible flat field spectrometer for extreme ultraviolet wavelengths
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1988227
Reference38 articles.
1. Radio-frequency-preionized xenon z-pinch source for extreme ultraviolet lithography
2. Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region
3. Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma
4. Xenon-emission-spectra identification in the 5–20-nm spectral region in highly ionized xenon capillary-discharge plasmas
5. Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency
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