Determination of flux ionization fraction using a quartz crystal microbalance and a gridded energy analyzer in an ionized magnetron sputtering system
Author:
Publisher
AIP Publishing
Subject
Instrumentation
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1148430
Reference6 articles.
1. Collimated magnetron sputter deposition
2. Directional deposition of Cu into semiconductor trench structures using ionized magnetron sputtering
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4. Fundamental characteristics of built‐in high‐frequency coil‐type sputtering apparatus
5. Magnetron sputter deposition with high levels of metal ionization
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