Structural characteristics of methylsilsesquioxane based porous low-k thin films fabricated with increasing cross-linked particle porogen loading
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2337772
Reference36 articles.
1. Supramolecular Approaches to Nanoscale Dielectric Foams for Advanced Microelectronic Devices
2. Effect of oxygen plasma exposure of porous spin-on-glass films
3. Preparation of low density poly(methylsilsesquioxane)s for LSI interlayer dielectrics with low dielectric constant. Fabrication of Ångstrom size pores prepared by baking trifluoropropylsilyl copolymers
4. Ambient-dried SiO 2 aerogel thin films and their dielectric application
5. Molecular Templating of Nanoporous Ultralow Dielectric Constant (≈1.5) Organosilicates by Tailoring the Microphase Separation of Triblock Copolymers
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