Factors affecting resolution in scanning electron beam induced patterning of surface adsorption layers

Author:

Hui Frank Y. C.,Eres Gyula,Joy David C.

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Cited by 15 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

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3. Resistless patterning of a chlorine monolayer on a Si(001) surface with an electron beam;Applied Surface Science;2011-08

4. Gas-assisted focused electron beam and ion beam processing and fabrication;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;2008

5. Photon-Stimulated H Desorption from Several H/Si(001) Surfaces for Resistless Lithography;Journal of the Korean Physical Society;2007-06-15

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