Structural and electrical properties of crystalline (1−x)Ta2O5–xAl2O3 thin films fabricated by metalorganic solution deposition technique
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.119888
Reference15 articles.
1. Enhancement of the dielectric constant of Ta2O5through substitution with TiO2
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3. Thin-Film Electroluminescent Device Employing Ta2O5RF Sputtered Insulating Film
4. Some microwave applications of BaSrTiO3 and high temperature superconductors
5. Rapid thermal processed thin films of reactively sputtered Ta2O5
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