Low-frequency noise in ZrS3 van der Waals semiconductor nanoribbons

Abstract

We report the results of the investigation of low-frequency electronic noise in ZrS3 van der Waals semiconductor nanoribbons. The test structures were of the back-gated field-effect-transistor type with a normally off n-channel and an on-to-off ratio of up to four orders of magnitude. The current–voltage transfer characteristics revealed significant hysteresis owing to the presence of deep levels. The noise in ZrS3 nanoribbons had spectral density SI ∼ 1/fγ (f is the frequency) with γ = 1.3–1.4 within the whole range of the drain and gate bias voltages. We used light illumination to establish that the noise is due to generation–recombination, owing to the presence of deep levels, and determined the energies of the defects that act as the carrier trapping centers in ZrS3 nanoribbons.