Study of the structure in rf glow discharges in SiH4/H2by spatiotemporal optical emission spectroscopy: Influence of negative ions
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.347013
Reference42 articles.
1. Plasma spectroscopy—Glow discharge deposition of hydrogenated amorphous silicon
2. Evidence for a time dependent excitation process in silane radio frequency glow discharges
3. Ion dynamics of rf plasmas and plasma sheaths: A time‐resolved spectroscopic study
4. Negative Ion Kinetics in RF Glow Discharges
5. Glow-discharge sheath electric fields: Negative-ion, power, and frequency effects
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