Localized etching of an insulator film coated on a copper wire using an atmospheric-pressure microplasma jet-Reference-Cited by-同舟云学术

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Localized etching of an insulator film coated on a copper wire using an atmospheric-pressure microplasma jet

Published:2007 Issue:4 Volume:78 Page:043510
ISSN:0034-6748
Container-title:Review of Scientific Instruments
language:en
Short-container-title:Rev. Sci. Instrum.

Author:

Yoshiki Hiroyuki

Publisher

AIP Publishing

Subject

Instrumentation

Reference9 articles.

1. NANOJET: Nanostructuring via a downstream plasmajet

2. Etching polyimide with a nonequilibrium atmospheric-pressure plasma jet

3. Localized Removal of a Photoresist by Atmospheric Pressure Micro-plasma Jet Using RF Corona Discharge

4. Localized Plasma Processing of Materials Using Atmospheric-Pressure Microplasma Jets

5. Maskless etching of microstructures using a scanning microplasma etcher

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Emission Properties of an Atmospheric Pressure Argon Plasma Jet Excited by Barrier Discharge;Ukrainian Journal of Physics;2015-12

2. Emission properties of an atmospheric-pressure helium plasma jet generated by a barrier discharge;Optics and Spectroscopy;2014-06

3. Characterization of inverted pyramidal hollow cathode microplasma devices operating in reactive gases for maskless scanning plasma etching;Sensors and Actuators A: Physical;2012-06

4. Study of residual stress-induced deformation of multilayer cantilever for maskless microplasma etching;Microsystem Technologies;2011-12-13

5. Design and fabrication of microcantilever probe integrated with microplasma reactor for maskless scanning plasma etching;Sensors and Actuators A: Physical;2011-10

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