Wavelength dependence of the excimer laser etching characteristics of a polymeric resist
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.97886
Reference11 articles.
1. Excimer laser etching of polymers
2. Self‐developing photoresist using a vacuum ultraviolet F2excimer laser exposure
3. Direct-etching studies of polymer films using a 157-nm F_2 laser
4. Excimer laser etching of polyimide
5. Excimer laser lithography: Intensity-dependent resist damage
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