Understanding the discharge current behavior in reactive high power impulse magnetron sputtering of oxides
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4799199
Reference33 articles.
1. Ionized physical vapor deposition (IPVD): A review of technology and applications
2. High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
3. Titanium oxide thin films deposited by high-power impulse magnetron sputtering
4. Effect of peak power in reactive high power impulse magnetron sputtering of titanium dioxide
5. High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering
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