Spectroscopic and fast photographic studies of excimer laser polymer ablation
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.341247
Reference24 articles.
1. Self‐developing photoresist using a vacuum ultraviolet F2excimer laser exposure
2. Ablative photodecomposition of polymer films by pulsed far-ultraviolet (193 nm) laser radiation: Dependence of etch depth on experimental conditions
3. Excimer laser projection photoetching
4. Excimer laser projection micromachined free-standing polymer films
5. Direct-etching studies of polymer films using a 157-nm F_2 laser
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