Thermal and oxidation stability of TixW1−x diffusion barriers investigated by soft and hard x-ray photoelectron spectroscopy-Reference-Cited by-同舟云学术

Thermal and oxidation stability of TixW1−x diffusion barriers investigated by soft and hard x-ray photoelectron spectroscopy

Published:2021-05-21 Issue:19 Volume:129 Page:195302
ISSN:0021-8979
Container-title:Journal of Applied Physics
language:en
Short-container-title:Journal of Applied Physics

Author:

Kalha C.¹^ORCID,Bichelmaier S.²,Fernando N. K.¹^ORCID,Berens J. V.²^ORCID,Thakur P. K.³^ORCID,Lee T.-L.³,Gutiérrez Moreno J. J.⁴^ORCID,Mohr S.⁴⁵^ORCID,Ratcliff L. E.⁶^ORCID,Reisinger M.²,Zechner J.²,Nelhiebel M.²,Regoutz A.¹^ORCID

Affiliation:

1. Department of Chemistry, University College London, 20 Gordon Street, London WC1H 0AJ, United Kingdom

2. Kompetenzzentrum Automobil- und Industrie-Elektronik GmbH, Europastraße 8, 9524 Villach, Austria

3. Diamond Light Source Ltd., Harwell Science and Innovation Campus, Didcot, Oxfordshire OX1 3QR, United Kingdom

4. Barcelona Supercomputing Center (BSC), C/ Jordi Girona 29, 08034 Barcelona, Spain

5. Nextmol (Bytelab Solutions SL), C/ Roc Boronat 117, 08018 Barcelona, Spain

6. Department of Materials, Imperial College London, London SW7 2AZ, United Kingdom

Funder

Engineering and Physical Sciences Research Council

EU Regional Development Fund

Barcelona Supercomputing Center

Thomas Young Centre

Analytical Chemistry Trust Fund

Diamond Light Source

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

https://aip.scitation.org/doi/pdf/10.1063/5.0048304

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