Study of electromigration‐induced resistance and resistance decay in Al thin‐film conductors
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.99517
Reference12 articles.
1. RESISTANCE MONITORING AND EFFECTS OF NONADHESION DURING ELECTROMIGRATION IN ALUMINUM FILMS
2. Effect of Oxygen on the Electromigration Behavior of Al Thin Films
3. Activation energy for electrotransport in thin aluminum films by resistance measurements
4. Measurement technique of electromigration
5. A new method for detecting electromigration failure in VLSI metallization
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