Contact reaction between Si and Pd‐W alloy films
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.325772
Reference14 articles.
1. Contact metallurgy for shallow junction Si devices
2. Study of Al/Pd2Si contacts on Si
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4. Characterization of polycrystalline layers by channelling measurements
5. Reaction kinetics of tungsten thin films on silicon (100) surfaces
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