Contact metallurgy for shallow junction Si devices

Author:

Kircher C. J.1

Affiliation:

1. IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Reference15 articles.

1. H. Sello, Ohmic Contacts to Semiconductors, edited by B. Schwartz (Electrochemical Society, New York, 1969), p. 277.

2. P. A. Totta and R. P. Sopher, IBM J. Res. Develop. 18, 226 (1969).IBMJAE0018-8646

3. J. A. Cunningham and R. H. Wakefield, Microelectronics and Reliability 9, 515 (1970).MCRLAS0026-2714

4. J. McCarthy, Microelectronics and Reliability 9, 187 (1970).MCRLAS0026-2714

5. R. H. Collins, E. G. Grochowsky, and W. D. North, IBM J. Res. Develop. 16, 2 (1972).IBMJAE0018-8646

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