Contact metallurgy for shallow junction Si devices
Author:
Affiliation:
1. IBM Thomas J. Watson Research Center, Yorktown Heights, New York 10598
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Reference15 articles.
1. H. Sello, Ohmic Contacts to Semiconductors, edited by B. Schwartz (Electrochemical Society, New York, 1969), p. 277.
2. P. A. Totta and R. P. Sopher, IBM J. Res. Develop. 18, 226 (1969).IBMJAE0018-8646
3. J. A. Cunningham and R. H. Wakefield, Microelectronics and Reliability 9, 515 (1970).MCRLAS0026-2714
4. J. McCarthy, Microelectronics and Reliability 9, 187 (1970).MCRLAS0026-2714
5. R. H. Collins, E. G. Grochowsky, and W. D. North, IBM J. Res. Develop. 16, 2 (1972).IBMJAE0018-8646
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