Domain control and periodic poling of epitaxial ScAlN
Author:
Affiliation:
1. Department of Electrical Engineering, Yale University 1 , New Haven, Connecticut 06511, USA
2. Department of Electrical Engineering and Computer Science, University of Michigan 2 , Ann Arbor, Michigan 48109, USA
Abstract
Funder
National Science Foundation
Defense Advanced Research Projects Agency
Semiconductor Research Corporation
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
https://pubs.aip.org/aip/apl/article-pdf/doi/10.1063/5.0156514/18113661/101103_1_5.0156514.pdf
Reference43 articles.
1. AlScN: A III-V semiconductor based ferroelectric;J. Appl. Phys.,2019
2. Strongly temperature dependent ferroelectric switching in AlN, Al1−xScxN, and Al1−xBxN thin films;Appl. Phys. Lett.,2021
3. High-temperature ferroelectric behavior of Al0.7Sc0.3N;Micromachines,2022
4. Fully epitaxial ferroelectric ScAlN grown by molecular beam epitaxy;Appl. Phys. Lett.,2021
5. Molecular beam epitaxy and characterization of wurtzite ScxAl1−xN;Appl. Phys. Lett.,2020
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4. CMOS-compatible photonic integrated circuits on thin-film ScAlN;APL Photonics;2024-06-01
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