Interface roughness evolution in sputtered WSi2∕Si multilayers
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.2422713
Reference26 articles.
1. Structure and interface properties of Mo/B4C/Si multilayers deposited by rf-magnetron sputtering
2. Recent advances in ion-assisted growth of Cr/Sc multilayer X-ray mirrors for the water window
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4. Interface imperfections in metal/Si multilayers
5. Thermally induced structural modification of Mo‐Si multilayers
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1. Impact of Substrate Thickness and Surface Roughness on Al/Ni Multilayer Reaction Kinetics;Advanced Engineering Materials;2024-06-07
2. Surface figure correction using differential deposition of WSi2;Advances in X-Ray/EUV Optics and Components XVIII;2023-10-03
3. X-ray mirrors with sub-nanometre figure errors obtained by differential deposition of thin WSi2 films;Journal of Synchrotron Radiation;2023-05-30
4. Asymmetric interface and growth mechanism in sputtered W/Si and WSi2/Si multilayers;Applied Surface Science;2022-12
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