The effects of electron surface interactions in geometrically symmetric capacitive RF plasmas in the presence of different electrode surface materials-Reference-Cited by-同舟云学术

The effects of electron surface interactions in geometrically symmetric capacitive RF plasmas in the presence of different electrode surface materials

Published:2019-06 Issue:6 Volume:26 Page:063505
ISSN:1070-664X
Container-title:Physics of Plasmas
language:en
Short-container-title:Physics of Plasmas

Author:

Sun Jing-Yu¹^ORCID,Wen De-Qi²,Zhang Quan-Zhi³^ORCID,Liu Yong-Xin¹^ORCID,Wang You-Nian¹^ORCID

Affiliation:

1. School of Physics, Dalian University of Technology, Dalian 116024, People's Republic of China

2. Department of Electrical and Computer Engineering, Michigan State University, East Lansing, Michigan 48824, USA

3. Research Group PLASMANT, University of Antwerp, Universiteitsplein 1, B-2610 Antwerp-Wilrijk, Belgium

Funder

National Natural Science Foundation of China

Publisher

AIP Publishing

Subject

Condensed Matter Physics

Link

http://aip.scitation.org/doi/pdf/10.1063/1.5094100

Reference40 articles.

1. Plasma Electronics

2. Physics of Radio-Frequency Plasmas

3. Physical and Mechanical Properties of Hard Nanocomposite Films Prepared by Reactive Magnetron Sputtering

4. Particle simulation of plasmas: review and advances

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