Monolayer graphene-insulator-semiconductor emitter for large-area electron lithography
Author:
Affiliation:
1. Department of Electrical and Computer Engineering, Duke University, Durham, North Carolina 27708, USA
Funder
National Science Foundation (NSF)
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.4984955
Reference30 articles.
1. Toward Sustainable Nanoproducts
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4. Electron beam lithography: resolution limits and applications
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