Site-selective formation of Si nanocrystal in SiO2 by femtosecond laser irradiation and Al deoxidization effects-Reference-Cited by-同舟云学术

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Site-selective formation of Si nanocrystal in SiO2 by femtosecond laser irradiation and Al deoxidization effects

Published:2008-04-14 Issue:15 Volume:92 Page:153112
ISSN:0003-6951
Container-title:Applied Physics Letters
language:en
Short-container-title:Appl. Phys. Lett.

Author:

Uchida Noriyuki,Mikami Youhei,Kintoh Hiroshi,Murakami Kouichi,Fukata Naoki,Mitome Masanori,Hase Muneaki,Kitajima Masahiro

Publisher

AIP Publishing

Subject

Physics and Astronomy (miscellaneous)

Link

http://aip.scitation.org/doi/pdf/10.1063/1.2905289

Reference16 articles.

1. Self-limiting behavior of scanning-electron-beam-induced local oxidation of hydrogen-passivated silicon surfaces

2. Nanometer‐scale local oxidation of silicon using silicon nitride islands formed in the early stages of nitridation

3. Ultrathin silicon-on-insulator vertical tunneling transistor

4. A study of the charging and dissociation of SiO2 Surfaces by AES

5. Pinpoint and bulk electrochemical reduction of insulating silicon dioxide to silicon

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1. Evolution of glass structure during femtosecond laser assisted crystallization of LaBGeO5 in glass;Journal of Non-Crystalline Solids;2021-01

2. Dual-Phase Evolution;Dual Phase Evolution;2013-11-13

3. Crystallization of Amorphous Si Nanoclusters in SiOx Films Using Femtosecond Laser Pulse Annealings;Journal of Nanoscience and Nanotechnology;2012-11-01

4. Formation of Si nanocrystals in glass by femtosecond laser micromachining;Materials Letters;2011-12

5. Femtosecond pulse crystallization of thin amorphous hydrogenated films on glass substrates using near ultraviolet laser radiation;JETP Letters;2011-07

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