Crystallization of Amorphous Si Nanoclusters in SiOx Films Using Femtosecond Laser Pulse Annealings-Reference-Cited by-同舟云学术

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Crystallization of Amorphous Si Nanoclusters in SiOx Films Using Femtosecond Laser Pulse Annealings

Published:2012-11-01 Issue:11 Volume:12 Page:8694-8699
ISSN:1533-4880
Container-title:Journal of Nanoscience and Nanotechnology
language:en
Short-container-title:j nanosci nanotechnol

Author:

Korchagina T. T.,Gutakovsky A. K.,Fedina L. I.,Neklyudova M. A.,Volodin V. A.

Publisher

American Scientific Publishers

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,General Chemistry,Bioengineering

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Interaction of low-fluence femtosecond laser pulses with a composite layer containing Ge nanoclusters: A novel type of nanofoam formation;Journal of Laser Applications;2022-05

2. Femtosecond laser-induced confined nanocrystallization in dielectric multilayers;Conference on Lasers and Electro-Optics;2022

3. Ultrafast laser interaction with transparent multi-layer SiO2/Si3N4 films;Journal of Applied Physics;2021-12-28

4. Femtosecond-laser-irradiation-induced structural organization and crystallinity of Bi2WO6;Scientific Reports;2020-03-12

5. Crystallization of Amorphous Germanium Films and Multilayer a-Ge/a-Si Structures upon Exposure to Nanosecond Laser Radiation;Semiconductors;2019-03

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