Mechanisms of adsorption and decomposition of metal alkylamide precursors for ultrathin film growth
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.3000654
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1. Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process
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5. Atomic Layer Deposition of Hafnium and Zirconium Oxides Using Metal Amide Precursors
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