Spatial structure of radio frequency ring-shaped magnetized discharge sputtering plasma using two facing ZnO/Al2O3 cylindrical targets for Al-doped ZnO thin film preparation-Reference-Cited by-同舟云学术

Spatial structure of radio frequency ring-shaped magnetized discharge sputtering plasma using two facing ZnO/Al2O3 cylindrical targets for Al-doped ZnO thin film preparation

Published:2017-05 Issue:5 Volume:7 Page:055310
ISSN:2158-3226
Container-title:AIP Advances
language:en
Short-container-title:AIP Advances

Author:

Sumiyama Takashi¹,Fukumoto Takaya¹,Ohtsu Yasunori¹^ORCID,Tabaru Tatsuo²^ORCID

Affiliation:

1. Department of Electrical and Electronic Engineering, Graduate School of Science and Engineering, Saga University, 1 Honjo-machi, Saga 840-8502, Japan

2. Advanced Manufacturing Research Institute, National Institute of Advanced Industrial Science and Technology, 807-1 Shuku, Tosu, Saga 841-0052, Japan

Funder

Japan Society for the Promotion of Science (JSPS)

Publisher

AIP Publishing

Subject

General Physics and Astronomy

Link

http://aip.scitation.org/doi/pdf/10.1063/1.4983851

Reference41 articles.

1. Untersuchungen der elektrischen und lichtelektrischen Leitf�higkeit d�nner Indiumoxydschichten

2. Highly Conductive, Transparent Films of Sputtered In[sub 2−x]Sn[sub x]O[sub 3−y]

3. High‐quality transparent conductive indium oxide films prepared by thermal evaporation

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