Langmuir Probe Measurements in the Gaseous Electronics Conference Rf Reference Cell-Reference-Cited by-同舟云学术

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Langmuir Probe Measurements in the Gaseous Electronics Conference Rf Reference Cell

Published:1995-07 Issue:4 Volume:100 Page:415
ISSN:1044-677X
Container-title:Journal of Research of the National Institute of Standards and Technology
language:
Short-container-title:J. Res. Natl. Inst. Stand. Technol.

Author:

Hopkins M.B.

Publisher

National Institute of Standards and Technology (NIST)

Subject

General Engineering

Cited by 81 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Langmuir Probe Measurements in a Dual-Frequency Capacitively Coupled rf Discharge;IEEE Transactions on Plasma Science;2024-04

2. Development of Wafer-Type Plasma Monitoring Sensor with Automated Robot Arm Transfer Capability for Two-Dimensional In Situ Processing Plasma Diagnosis;Sensors;2024-03-10

3. Inductively-coupled plasma discharge for use in high-energy-density science experiments;Journal of Instrumentation;2023-04-01

4. Langmuir probe without RF compensation;Plasma Sources Science and Technology;2022-08-01

5. Probe temperature effect on the curling probe and its correction technique;Plasma Sources Science and Technology;2022-07-01

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