Analysis of Dissociative Excitation Reaction of Tetramethylsilane with Microwave Discharge Flow of Ar
Author:
Affiliation:
1. Department of Chemistry, Nagaoka University of Technology
Publisher
The Materials Research Society of Japan
Link
https://www.jstage.jst.go.jp/article/tmrsj/38/2/38_239/_pdf
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1. Production of CH(A2Δ) radicals from the dissociative excitation reaction of C2H2with microwave discharge flow of Ar;Japanese Journal of Applied Physics;2015-05-29
2. Mechanism of Production of CN(X2Σ+) Radicals from the Decomposition Reaction of CH3CN with Microwave Discharge Flow of Ar;Plasma Chemistry and Plasma Processing;2014-02-12
3. Analysis of the production of the CH(A2Δ) state from the dissociative excitation of tetramethylsilane in the electron-cyclotron resonance plasma of Ar: The H2O-addition method;Japanese Journal of Applied Physics;2014-01-01
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